Semi conductor and Hi tech equipment manufacturer, ALD, Coating solution
Compact reactor Thermal ALD
ㆍCompact ALD Model
ㆍThermal ALD
ㆍWafer Size : ≤ 6″ Wafer
ㆍProcess temperature : up to 250°C
ㆍApplications : Oxide Film(Al2O3), etc
ㆍVery small Volume for process