개요
WLP, SOH, DPT Etching용 ICP 타입 Plasma Etcher
특징
Process Performance
- Specialized Critical Etch Process
: DRAM, Flash, 3D NAND and Logic Applications
- Fast Etch / Various Control Knobs for Uniform Etch Rate
- High Mask Selectivity / High Accuracy of CD Control
- Low Particle / Verticle Etching
Productivity / Hardware
- Cluster Transfer Module : Max. 6 Chambers
- Quadra Type Transfer Module : Max. 6 Chambers (All for Processing)
- ICP Type Etcher : High Plasma Density
- RF Sync Pulse Function : High Aspect Ratio
- Multi-Zone ESC Heating and 3Z-Tunale : Gas Radial Uniformity Control
- Low C.o.O / Long MTBC
- High Throughput