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Plasma Doping System, APIS
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APTC

Semi conductor process equipment manufacturer, Hybrid system, Chamber system products

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Manufacturer
APTC
Brand
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SKU
29450
Product Name
Plasma Doping System, APIS
Model Name
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APIS 300 plasma doping system is a next generation ion implanter: the ionized dopant gas, by plasma formation in a vacuum chamber, is very uniformly implanted onto the wafer surface.
This process application is an alternative toward ULSI era over the conventional ion implanter.

Semi conductor process equipment manufacturer, Hybrid system, Chamber system products
APTC was founded with the purpose to produce world-class semiconductor processing equipment. APTC is focused on engineering and technology for plasma-related semiconductor processing equipment. Despite its short history, APTC has made significant progress including 300mm etchers, plasma doping systems, and LED etchers. In light of a multidisciplinary area that requires processing equipment, APTC aims to combine all areas of engineering. Starting with etchers, APTC aspires to be the worldwide leader in semiconductor processing equipment. The semiconductor processing equipment will naturally have a significant impact on related industries such as materials processing, vacuum technology, RF engineering, etc.
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