Vacuum system manufacturer, Vacuum evaporation, Etching equipment, Washing equipment, Vacuum parts and more
Overview
Korea Vacuum Tech, Inc. (KVT) is proud to introduce the
latest revolutionary addition to our product line, the
CVD system.
Chemical Vapor Deposition is a chemical reactive
process used to produce high –purity, high performance
solid materials in a vacuum state. In a typical
CVD process, the water(substrate) is exposed to one or
more volatile precursors which react and / or decompose
on the substrate surface to produce a desired
deposit. Thermal Chemical Vapor Deposition(Thermal
CVD) is a unique form of the CVD process used primarily
to deposit thin lms from a gaseous state(Vapor) to
a solid state on some substrate. Thermal CVD is
dependent upon thermal energy to create of maintain
a chemical reaction.
Features
≻ 3 Zone Furnace for temperature up to 1000℃
≻ Sample size : up to 2”
≻ Easy to sample loading & unloading by loading bar
≻ 3” dia. Quartz Tube
≻ Operation pressure ~ 1Torr
≻ No water cooling
1990(W) x 850(D) x 1200 (H) | |
250 kg | |
Loading bar | Sample retract & extend |
Size : Piece to 2 inch | |
Heating: up to 1000℃ on substrate Three zone controlled furnace | |
Rotary pump | |
Convection gauge | |
Gas Supply | Ar, H2, CH4, N2 MFC |
Auto throttle valve & CDG sensor |