Motivation for development
This is a roll to roll duplex exposure machine developed and supplied out of necessity of the light exposure machine with faster productivity at a lower cost because the demand for EMI MESH Filters increases exponentially. It has been developed in the productivity equivalent to three existing exposure machines at the cost of being equal in value to two exposure machines. Also, it can form the circuit of 8㎛ to 11㎛, and make a large-area(1300mm*800mm), single-sided, collimated exposure fast, leading to high productivity. 

Main Use : for film-manufacturing process that needs electromagnetic shielding 

Product Features
① EMI automatic exposure machine is composed of three parts of exposure state, optical system, and cooling unit, and the function of each part is as follows: It also has the accumulator as the buffer zone in the middle of the equipment.
② Exposure stage: contact the mask and the EMI film each other, using the up-and-down movement motor and the cylinder, and then stick the mask fast to the EMI film, using a vacuum, before using UV rays (UV-350nm) for light exposure.
③ Optical system: extract and supply only the desired area of a wavelength band(365nm) of the light generated from the UV lamp
④ Cooling unit: emit the heat generated from the UV lamp to the outside, and use the cooling water to maintain the temperature of the exposure area at a certain temperature. 

Main Specifications