Vacuum, Vacuum Evaporation, Coating, Sputtering, EBeam
Process gas control is maintained by two mass flow controller.
One is configured for constant flow operation dedicated to ion source One is configured for constant flow or variable flow rate dedicated to the reactive evaporation process.
Both gas flow controller are integrated to the system host computer.
Each controller is capable of controlling a 0~100 sccm flow rate in fixed flow mode.