Korea Vacuum Tech, Ltd. proudly introduces the latest
addition to our family of products, the Intelsi-R Series ‘Bench Top’ RTP
system, which puts the annealing process into a compact size.
Designed to process samples up to 2” (50.8mm) wafer size in various
gas environments using precise digital display readout and full
computer control, the Intelsi-R Series can be conveniently configured,
is simple to operate and easy to maintain.The modular design of the Intelsi-M
makes it highly configurable to meet specific customer needs and numerous
stock options are also available. A fully automated Laptop PC helps round out
this extremely usable yet robust diminutive package.
Advantages
≻ Easy to install, easy to operate
≻ Precise reproducible coatings - consistent
≻ Compact design / small footprint
≻ Quick and simple loading / unloading
Features
≻ Rapid Heating: 100℃/sec (212℉/sec)
≻ Extreme versatility
≻ High capacity vacuum pumping
≻ Fully automated PC control
≻ Capable of producing very thin resultant films
Applications
≻ Annealing after ion implantation
≻ III -V semiconductor
≻ Damage recovery after dry etch
≻ Silicide processing
Specifications
Process Chamber | Stainless steel |
Vacuum Pumping Station | Rotary Pump |
Temperature Range | 100℃ ~ 1000℃ (212℉ ~ 1832℉) |
Temperature uniformity | Less than <± 5℃ (41℉) for 50.8mm (2”) wafer |
Heating element | Quartz Lamp |
Ultimate Pressure | Less than 5.0E-3Torr |
626mm(W) x 520mm(D) x 475mm(H) - 24.5”(W) x 20.5” (D) x 18.75” (H) |
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