BATCH TYPE RTP FURNACE

The ECM Jetlight 50 system is a compact and robust RTP furnace.

suitable for the Rapid Thermal Annealing (RTA) of a wide range of material substrates and structures (Electronic Grade Si, steel glass, SoG c-Si, III-V, II-VI, Germanium, quartz, ceramics etc.) with a maximum size of 2-inch diameter (50 mm).

This RTP furnace is equipped with a tubular quartz reactor chamber and is therefore compatible with the processing of 3D samples with a maximum length of 100mm.

PLUS AND BENEFITS

The JetLight system has been developed to meet the requirements of universities and research laboratories. The temperature measurement control system provides accurate and repeatable thermal control across the temperature range.

Silicon Carbide coated graphite susceptors are available for processing of various small samples and compound semi materials. The high reliability and high performance characteristics of the JetLight enable small-scale production.

The process can take place at atmospheric pressure or under vacuum. A PID system provides accurate and repeatable thermal control across the temperature range. RTP Process control is via computer, running PIMS dedicated supervisor that enables recipe programming and monitoring of the entire RTP system.

POSSIBLE APPLICATIONS

• Rapid thermal annealing (RTA)
• Rapid thermal oxidation (RTO)
• Rapid thermal nitridation (RTN)
• Rapid thermal diffusion (RTD)
• Printed contact firing
• Crystallization
• Densification
• Structural stress relaxation

EFFECTIVE DIMENSIONS

JETLIGHT

OPTIONS

• Primary vacuum pump
• Susceptor