Atomic Layer Deposition (ALD)
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ALD
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반도체 및 하이테크장비 제조업체, ALD, Coating Solution

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070-4651-5331
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cnone@cn-1.co.kr
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Atomic Layer Deposition (ALD)
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Atomic Layer Deposition(ALD)
is a powerful thin film deposition innovator based on the sequential reaction of gas precursors at a surface.

ㆍPrecise atomic level thickness and composition control

ㆍExcellent conformality for deep trench with high aspect ratio and complex 3D nano- & micro-structures

ㆍExcellent thickness uniformity in large area substrates

ㆍLower process temperature than CVD

ㆍAvailable Materials : Metal, Metal oxide, Metal nitride, Metal sulfide, Laminate, mixed materials

ㆍApplication fields : Semiconductor, Display, Solar cell, LED, MEMS, Optical-, Bio-, Nano- and Flexible devices

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반도체 및 하이테크장비 제조업체, ALD, Coating Solution
CN1 Co., Ltd. is a semiconductor and high-tech equipments manufacturing company located in Dongtan Industrial Complex, Hwaseong, Gyeonggi, Korea. We try our best to provide better equipment solution service based on many years of experience and technology. We are doing our best rather than being the best with trust, sincerity, and responsibility.
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