Traveling wave type ALD
ㆍTraveling wave type thermal ALD
ㆍLaminar gas flow (Side gas flow)
ㆍVariable gas delivery system : Bubbler, LDS
ㆍLow particle generation
ㆍVery small volume for process
ㆍAvailable laminated & mixed process
ㆍProcess temperature : up to 450°C
ㆍPrecursor canister : 4EA(standard)
ㆍSubstrate size :
4 ~ 8” wafer
2G : 370x470mm glass
ㆍApplications
Dielectric thin films : Al2O3, HfO2, ZrO2, TiO2, ZnO2, STO, ZnS, Laminate films, etc.