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반도체 및 하이테크장비 제조업체, ALD, Coating Solution

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070-4651-5331
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cnone@cn-1.co.kr
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Showerhead type Plasma-Enhanced ALD (PE-ALD)

ㆍPlasma process & treatment

ㆍAdjustable the gap between showerhead and substrate

ㆍVariable gas delivery system : Bubbler, Vaporizer, LDS

ㆍCompletely separated source delivery

ㆍConfiguration ALD/CVD mode process

ㆍGood film uniformity & quality

ㆍProcess temperature : up to 500°C

ㆍPrecursor canister : 4EA(standard)

ㆍSubstrate Size : 4 ~ 12” wafer

ㆍApplications
   Dielectric thin films : Al2O3, HfO2, ZrO2, TiO2, ZnO2, ZnS, GST, Laminate films, etc.
   Nitride films : AlN, TiN, TiAlN, TaN, etc.
   Metal films : Ru, Co, Ti, Ni, etc.

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(주)씨엔원
반도체 및 하이테크장비 제조업체, ALD, Coating Solution
CN1 Co., Ltd. is a semiconductor and high-tech equipments manufacturing company located in Dongtan Industrial Complex, Hwaseong, Gyeonggi, Korea. We try our best to provide better equipment solution service based on many years of experience and technology. We are doing our best rather than being the best with trust, sincerity, and responsibility.
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