지금 보고 계신 제품의 제조사에요
(주)씨엔원
제품 상세 정보
Compact reactor Thermal ALD
ㆍCompact ALD Model
ㆍThermal ALD
ㆍWafer Size : ≤ 6″ Wafer
ㆍProcess temperature : up to 250°C
ㆍApplications : Oxide Film(Al2O3), etc
ㆍVery small Volume for process
반도체 및 하이테크장비 제조업체, ALD, Coating Solution
CN1 Co., Ltd. is a semiconductor and high-tech equipments manufacturing company located in Dongtan Industrial Complex, Hwaseong, Gyeonggi, Korea.
We try our best to provide better equipment solution service based on many years of experience and technology.
We are doing our best rather than being the best with trust, sincerity, and responsibility.