Overview
KVT has developed the evaporator system with high precision deposition rate control
and unique design & technology. KVE series is designed and manufactured to
deposition equipment with variable item. KVE-TG Series is consisted of deposition
system with glove box system. These systems can prevent the oxidation of sample from external air.
If you use the mask when you deposit the thin film, you can make the device without venting the chamber.
Also if you enter the deposition condition to recipe, you will always get the thin film of same characteristic.
Features
≻ Mixing source
The system has multi thermal source. It can use the organic source with the metal source. Also can be possible that is co-deposition.
≻ Multi-Layer Deposition
Multiple source assemblies provide for sequential multi-layer or complex alloy deposition In Situ.
≻ Make the complete sample at once.
The system has the mask changer. So you can get the complete sample without venting the chamber. It has advantage that reduce the chamber pumping time and prevent the oxidation of sample.
Process Chamber | Stainless steel |
Vacuum Pumping Station | TMP / Cryo pump |
Loadlock Chamber | Glove box intergrated |
Substrate Unit | Rotation / Heating / Cooling |
Sample Size | 4” or more |
Power Supply Unit | 10V,300A / 10V,100A |
Source Type & Number | Boat, Crucible / Two or more |
Process Control Type | |
Film Thickness Uniformity | < ±5% |
Ultimate Pressure | < 5.0E-7Torr |
Overview
KVT has developed the evaporator system with high precision deposition rate control
and unique design & technology. KVE series is designed and manufactured to
deposition equipment with variable item. KVE-TG Series is consisted of deposition
system with glove box system. These systems can prevent the oxidation of sample from external air.
If you use the mask when you deposit the thin film, you can make the device without venting the chamber.
Also if you enter the deposition condition to recipe, you will always get the thin film of same characteristic.
Features
≻ Easy sample loading
The system is installed in an expanded form of the process chamber which placed above the main process chamber. Therefore it doesn’t need the loading arm. So you can make a sample loading very simply.
≻ Prevent the oxidation of sample
When the sample is taken out of the chamber, it is immediately connected to the glove box, protecting the sample from oxidation.
Process Chamber | Stainless steel |
Vacuum Pumping Station | TMP / Cryo pump |
Loadlock Chamber | |
Substrate Unit | Rotation / Heating / Cooling / Tilt |
Sample Size | 4” or more |
Power Supply Unit | 10V,300A / 10V,100A |
Source Type & Number | Boat, Crucible / Two or more |
Process Control Type | DC, Auto |
Film Thickness Uniformity | < ±5% |
Ultimate Pressure | < 5.0E-7Torr |
Overview
KVT has developed the evaporator system with high precision deposition rate control
and unique design & technology. KVE series is designed and manufactured to
deposition equipment with variable item. KVE-TG Series is consisted of deposition
system with glove box system. These systems can prevent the oxidation of sample from external air.
If you use the mask when you deposit the thin film, you can make the device without venting the chamber.
Also if you enter the deposition condition to recipe, you will always get the thin film of same characteristic.
Features
≻ Easy sample loading
The system is installed in an expanded form of the process chamber which placed above the main process chamber. Therefore it doesn’t need the loading arm. So you can make a sample loading very simply.
≻ Prevent the oxidation of sample
When the sample is taken out of the chamber, it is immediately connected to the glove box, protecting the sample from oxidation.
Process Chamber | Stainless steel |
Vacuum Pumping Station | TMP / Cryo pump |
Loadlock Chamber | Glove box intergrated |
Substrate Unit | Rotation / Heating |
Sample Size | 4” or more |
Power Supply Unit | 10V,300A / 10V,100A |
Source Type & Number | Boat, Crucible / Two or more |
Process Control Type | PLC Semi-auto |
Film Thickness Uniformity | < ±5% |
Ultimate Pressure | < 5.0E-7Torr |
Overview
KVT has developed the evaporator system with high precision deposition rate control
and unique design & technology. KVE series is designed and manufactured to
deposition equipment with variable item. KVE-TG Series is consisted of deposition
system with glove box system. These systems can prevent the oxidation of sample from external air.
If you use the mask when you deposit the thin film, you can make the device without venting the chamber.
Also if you enter the deposition condition to recipe, you will always get the thin film of same characteristic.
Features
≻ Easy sample loading
The system is installed in an expanded form of the process chamber which placed above the main process chamber. Therefore it doesn’t need the loading arm. So you can make a sample loading very simply.
≻ Prevent the oxidation of sample
When the sample is taken out of the chamber, it is immediately connected to the glove box, protecting the sample from oxidation.
Process Chamber1 | Stainless steel |
Vacuum Pumping Station | TMP / Cryo pump |
Process Chamber2 | Glove box intergrated |
Substrate Unit | Rotation / Heating |
Sample Size | 4” or more |
Power Supply Unit | 10V,300A / 10V,100A |
Source Type & Number | Boat, Crucible / Two or more |
Process Control Type | PLC Semi-auto |
Film Thickness Uniformity | < ±5% |
Ultimate Pressure | < 5.0E-7Torr |