Overview

 An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

≻ Excellent Thickness Uniformity

        The KVE Series KVE-2000L System provide excellent thickness uniformity of resultant films.

     ≻ Always maintain high vacuum degree in process

        These systems have a process chamber and a loadlock chamber. Loadlock chamber is used

        for sample loading. So process chamber is always maintained high vacuum state

     ≻ Semi-auto system control by PLC

Overview

 An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

≻ Excellent Thickness Uniformity

        The KVE Series KVE-E2000 System provide excellent thickness uniformity of

        resultant films even for substrates that have the same diameter as the sputtering cathode assembly

≻ No loadlock chamber

≻ Semi-auto system control by PLC

Overview

An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

Features

≻ Excellent Thickness Uniformity

        The KVE Series  E-Beam Evaporator System provide excellent thickness uniformity of 

        resultant films. if you deposit the thin film under same conditions, you will get a thin films 

        of same characteristics.

≻ Full Auto control

        These systems provide the ‘auto button’ to user for convenience of user. Fully automated

        vacuum process control system.

≻ Always maintain high vacuum degree in process

        These systems have a process chamber and a loadlock chamber. Loadlock chamber is used

        for sample loading. So process chamber is always maintained high vacuum state.

Overview

An evaporator uses an electric resistance heater or high-energy beam to melt material

and to raise its vapor pressure to a useful range. This process takes place in a high

vacuum state to allow the vapor to reach the substrate without reacting with or

scattering against other gas-phase atoms in the chamber while reducing the

incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series

evaporation systems are capable of fabricating multi-layer thin films by applying this

co-deposition process.

Features

≻ Excellent Thickness Uniformity

    The KVE Series E-Beam Evaporator System provide excellent thickness uniformity of 

    resultant films. if you deposit the thin film under same conditions, you will get a thin films 

    of same characteristics

≻ Full Auto control

    These systems provide the ‘auto button’ to user for convenience of user. Fully automated

    vacuum process control system