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ICP-RIE Series
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Korea Vacuum Tech

Vacuum system manufacturer, Vacuum evaporation, Etching equipment, Washing equipment, Vacuum parts and more

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Manufacturer
Korea Vacuum Tech
Brand
-
SKU
88722
Product Name
-
Model Name
ICP-RIE Series
Size
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Weight
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Product Details

Overview

An Inductively Coupled Plasma (ICP) is a type of plasma source in which the energy is

supplied by electrical currents produced by electromagnetic induction; that is, by time-

varying magnetic fields. In its simplest form, an inductively coupled plasma consists of a

vacuum vessel, into which the gas to be ionized is administered, and an induction coil,

driven by a source of RF power. The coil is generally separated from the vacuum region

by a dielectric window. The wide range of applications for RF-driven, inductively

coupled plasma sources has recently expanded into processing tools for coating or

etching systems in the microelectronics industry.


System configuration

Substrate size

2” - 6” (50.8mm - 150mm)

Etch Uniformity

1.06±% within 3” wafer

Etch rate

Process Chamber

Al anodized Chamber

He backside cooling / Bias / Chiller (-20℃ ~ 50℃)

ICP source with plasma spiral coil


Korea Vacuum Tech  ICP-RIE Series

Korea Vacuum Tech
Vacuum system manufacturer, Vacuum evaporation, Etching equipment, Washing equipment, Vacuum parts and more
KVT has researched many plasma related studies. The main products are vacuum deposition systems (PVD,CVD), etcher, cleaning systems for R & D and device mass production, thermal process and customized vacuum systems.  KVT has produced vacuum systems for faster and more convenient process, and especially fully automated systems has been developed for device mass production. We have enhanced export to US, Japan, and have got good reputation about quality. Also KVT has KA A9001/ISO 9001/EN ISO 9001 related design, development, production, and service.
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