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MIS Wet Etch
Model Name
DW-07
Series
Semiconductor Equipment
Data
-
Manufacturer information
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MISSemi conductor manufacturing equipment manufacturer, Auto Decaper, Track System, Vacuum Valve and more
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Manufacturer
MIS
Brand
-
SKU
43678
Product Name
MIS Wet Etch
Model Name
DW-07
Size
-
Weight
-
Product Details

Function & Features 


- Automatic chemical decapsulation equipment 
- The functions of etching, heating, acetone cleaning, and drying available 
- Protecting workers from harmful chemicals 
- Minimizing damage etching of copper in the case of copper wired IC 
- Minimizing the damage on the ball or the tape at the bottom of a package 
- Fast, safe, and efficient decapsulation
- Dual heating (MIS-specialized technology) 
- More precise, faster, and safer decap possible. 
- Repetitions made simple using recipe files 
- Consumable gaskets are unnecessary and very small amount of etching chemical is used. 
- Expanded decap possibility for various sizes and patterns of packages 
- Minimal maintenance and repair costs, and long lifecycles
- LED Chip Package Decap available

 

Specification

Item Description
Dimension 740(W) x 600(D) x 1650(H) mm
Weight Approx. 180 kg
Procedure Etching, Heating, Cleaning
Handling IC Size 2x2 mm ~ 50x50 mm
Etchant Fuming Nitric Acid, Sulfuric Acid, Fuming Sulfuric Acid
Cleaning Solution Acetone
Heating Temperature 1. Beam Heater : (Room Temp.)~ 400 °C
2. Jig Heater : (Room Temp.)~ 250 °C
Free Control by Dual Heating System
Process Time Etching~Cleaning: 3~15 min. (Average Time)
Utility Roted Voltage : AC 220V/110V, 1 Phase
Roted Current : 15A
Roted Frequency : 50 ~ 60 Hz
Air Pressure : 6kg/㎠ (bar)
Fume Exhaust Line
De-Ionized Water Supply / Drain
Program Microprocessor Control Panel
MISSemi conductor manufacturing equipment manufacturer, Auto Decaper, Track System, Vacuum Valve and more
MIS Auto Decaper is the world’s first automated robot system that safely and effectively removes the surface molding (EMC: Epoxy Molding Compounds) of packaged semiconductors and electronic parts. It is the only machine that can substitute the existing decapsulation work that is mostly done by hands and several machines. In addition, MIS has released the world’s first etching machine, Deprocessor (Auto Wet Station) that can decap micromini semiconductors and can do the partial etching work for silicone chips and the delaminating work (which has the precision of micro meter) that selectively and safely delaminates the layer of the chip composed of several layers.  For this, in December 2005, MIS made a contract for joint technical execution with Korea Institute of Science and Technology, and worked on the research and development. The project was selected by Samsung Electronics as a str-ategic task and in February 2007, MIS Auto-Deprocessor (Auto Wet Station) was developed and supplied.  And then, it was acknowledged by the Korea Development Bank in terms of its technology and business possibility so it successfully attracted some funds from it and since then, MIS has been doing its best.  The semiconductor etching work needed several machines and dangerous manual works, but now it can be done by 1 unit of MIS auto robot system. MIS has been putting its focus on the development of the equipment making prompt and precise work performance.  As a result of the efforts, now MIS can guarantee safety in working for those who use equipment, and further, it can bring the improvement in working efficiency and the remarkable reduction of production costs to customers.  MIS will keep working on research and development, and will exert itself to develop new and innovative products with the best performance in the fields of nano processing systems and displays. MIS will do its best for customersatisfaction. 
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